[1]Hugh O Pierson.Handbook of chemical vapor deposition(CVD)[M].Second Edition.New York: Noyes Publications,1999: 194-205.
[2]李恒德,马春来.材料科学与工程国际前沿[M].山东:山东科学技术出版社,2003:328-370.
[3]Seiichiro Matsumoto,Yoichiro Sato,Masayuki Tsutsumi.Growth of diamond particles from methane-hydrogen gas[J] .Journals of Matericals Science,1982,11(17):3106-3112.
[4]Jingbiao Cui,Rongchuan Fang.Characterization of the diamond growth process using optical emission spectroscopy[J]. Journal of Applied Physics,1997,81(6):2856-2862.
[5]Chiang M J,Hon M H.Optical emission spectroscopy study of positive direct current bias enhanced diamond nucleation[J] .Thin Solid Films,2008,516(15):4765-4770.
[6]Baránková H,Bárdo L.Studies of the optical emission from a hydrogen-hydrocarbon r.f. plasma jet stream during diamond film depositon [J].Diamond & Related Materials,1993,2 (2-4) : 347-352.
[7]Liao Y,Li C H,Ye Z Y,et al. Analysis of optical emission spectroscopy in diamond chemical vapor depositon[J].Diamond & Related Materials,2000,9(9-10):1716-1721.
[8]王启亮.MPCVD法制备多晶和单晶金刚石及性质研究[D].吉林:吉林大学凝聚态物理系,2009.
[9]Paul C Redfern.Theoretical studies of growth of diamond (110) from dicarbon[J].The Journal of Physical Chemistry,1996,100(28):11654-11663.
[10]J R 罗思.工业等离子体工程第Ⅰ卷基本原理[M].北京:科学出版社,1998:318-350.
[11]Zhou Haiyang,Jun Watanabe,Masato Miyake,et al. Optical and mass spectroscopy measurements of Ar/CH4/H2 micowave plasma for nano-crystalline diamond film deposition[J].Diamond & related Materials,2007,16(4-7 ) :675-678.
[12]Luque J,Juchmann W,Brinkman E A,et al. Excited state density distributions of H,C,C2 ,and CH by spatially optical emission in a diamond depositing dc-arcjet reactor[J].Journal of Vacuum Science and Technology.A:Vacuum ,Surfaces and Films,1998,16 (2):397-408.
[13]Vandevelde T ,Nesladek M ,Quaeyhaegens C,et al.Optical emission spectroscopy of the plasma during CVD diamond growth with nitrogen addition[J].Thin Solid Films,1996,290 -291: 143-147.
[14]翁国峰,湛玉龙,陶利平.高压微波氢等离子体Balmer线系的实验[J].武汉工程大学学报,2011,33(7):73-76.
[15]Han J C,Chao Ye,Masako suto,et al.Fluorescence from photoexcitation of C2H2 at 50-106 nm[J].Journal of Chemical Physics,1989,90(8):4000-4007.
[16]Deutsch H,Becker K,Matt S.Theoretical determination of absolute electron-impact ionization cross sections of molecules[J].International Journal of Mass Spectrometry,2000,197:37-69.
[17]黄元盛,罗承萍,邱万奇,化学气相沉积金刚石薄膜的晶体缺陷和杂质[J].中国表面工程,2004(1):5-9.
[18]满卫东,谢鹏,汪建华,等.甲烷浓度对批量生产金刚石涂层刀片的影响[J]. 硬质合金,2008,25(3):154-157.
[19]满卫东,孙蕾,汪建华,等.微波CVD金刚石薄膜作CVD散热片的制备[J].材料导报,2007,21(11A):316-318.
[1]王凡生,刘 繁*,汪建华,等.金刚石半导体器件的研究进展[J].武汉工程大学学报,2020,42(05):518.[doi:10.19843/j.cnki.CN42-1779/TQ.202002011]
WANG Fansheng,LIU Fan*,WANG Jianhua,et al.Review of Diamond Semiconductor Devices[J].Journal of Wuhan Institute of Technology,2020,42(06):518.[doi:10.19843/j.cnki.CN42-1779/TQ.202002011]