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[1]杨振东,郭玉莹,孙中溪*.纳米氧化硅的制备及其对Cu2+的吸附行为[J].武汉工程大学学报,2009,(03):1-3.
 YANG Zhen dong,GUO Yu ying,SUN Zhong xi.The synthesis of nanoscale silica and its adsorption behaviors for Cu2+[J].Journal of Wuhan Institute of Technology,2009,(03):1-3.
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纳米氧化硅的制备及其对Cu2+的吸附行为()
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《武汉工程大学学报》[ISSN:1674-2869/CN:42-1779/TQ]

卷:
期数:
2009年03期
页码:
1-3
栏目:
化学与化学工程
出版日期:
2009-03-28

文章信息/Info

Title:
The synthesis of nanoscale silica and its adsorption behaviors for Cu2+
文章编号:
16742869(2009)03000103
作者:
杨振东郭玉莹孙中溪*
济南大学化学化工学院,山东 济南 250022
Author(s):
YANG ZhendongGUO YuyingSUN Zhongxi
School of Chemistry and Chemical Engineering,University of Jinan,Jinan 250022,China
关键词:
正硅酸乙酯水解法纳米氧化硅Cu2+吸附
Keywords:
solgas methodsurface acidbase propertiesCu2+ adsorption
分类号:
O614
DOI:
-
文献标志码:
A
摘要:
采用正硅酸乙酯水解法,根据溶胶凝胶的原理,制备了纳米氧化硅;并用BET、TEM等方法表征其比表面积,粒径大小及形貌;用电位滴定的方法研究了SiO2的表面酸碱性质;用分光光度法测定出不同条件(包括pH值、SiO2的用量等)下SiO2对Cu2+的吸附百分率.研究结果表明纳米氧化硅对H+有很强的吸附能力,在pH为3~5范围内,SiO2对Cu2+的吸附百分率随着pH值的不同有明显改变,在pH为4.5,浓度大于10 g/L时,SiO2 对Cu2+的吸附率达到最佳状态.
Abstract:
In this paper nanoscalesilica were prepared by the hydrolysis of tetraethoxysilane (TEOS) using the solgel method. The specific surface area,particle size and morphology of synthesized nanoparticles were characterized with BET and TEM techniques. By means of potentiometric titration techniques,the surface acidbase properties of SiO2 were investigated. Testing results demonstrated that the synthesized silica possess very high adsorption capacity for H+. In addition,the influence of various variables such as the solution pH,quantities of SiO2 for adsorption of Cu2+ were studied. It was revealed that the adsorption percentage at silica surfaces change dramatically under pH value of 3~5 and at the pH equals 4.5 and the concentration of silica is more than 10 g/L,the adsorption of copper ions at silica surface reaches an optimum state.

参考文献/References:

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备注/Memo

备注/Memo:
收稿日期:20081027基金项目:国家自然科学基金(NO.20677022)和国家自然科学重点基金(NO.20537020)
作者简介:杨振东(1985),男,山东济南人,硕士研究生.研究方向:固/液界面化学. 指导老师:孙中溪,教授,博士,博士研究生导师.研究方向:固/液界面化学.
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